The PANalytical X’pert MRD system #2 features a theta/2theta vertical four-circle system that includes phi and psi rotations along with x, y, and z sample translations. This advanced configuration allows for precise measurements with a high-speed PIXcel line detector that has a pixel size of 55 microns, providing detailed and accurate data for various applications. Users can conduct general thin film and bulk phase analysis, as well as stress and texture analysis, making it suitable for a wide range of materials. With its ability to operate at high temperatures of up to 900°C and utilize various optical configurations, it greatly enhances the efficiency of analysis processes, delivering medium resolution, high-intensity results. The Micro X-ray Diffraction (XRD) setup offers spatial resolution between 100 and 400 microns, making it an indispensable tool for investigating the crystallographic properties of ultra-thin films.
| Features | Specifications |
|---|---|
| theta/2theta vertical four-circle system with phi | psi rotations and x,y,z sample translation, |
| proportional detector and high-speed PIXcel line detector (pixel size 55 microns) | |
| Radiation / wavelength | Cou K-alpha, 0.15418 nm |
| Main Optics Option 1 | General thin film and bulk phase, stress and texture analysis |
| Main Optics Option 1 | Point focus beam, crossed-slit collimator or x-ray lens, parallel plates collimator, flat graphite monochromator and proportional detector |
| Main Optics Option 2 | Fast texture and stress configuration using 1D detector |
| Main Optics Option 2 | Point focus beam, x-ray lens, PIXcel line detector in high-speed mode |
| Main Optics Option 3 | Micro XRD setup for surface spatial resolution between 100 and 400 microns |
| Main Optics Option 3 | Point focus beam, 100-microns monocapillary primary optics, PIXcel line detector in high-speed mode |
| Optional attachment | dome-shaped Anton Paar DHS900 hot stage for in-situ high temperature (up to 900°C) analysis under air or vacuum |
| Applications | General thin film or coatings analysis |
| Applications | Medium resolution / high-intensity analysis of lattice constant, strain, crystallographic orientation, diffuse scattering, dislocation density, reciprocal lattice mapping |
| Applications | Glancing incidence x-ray diffraction for analysis of ultra-thin films or analysis of depth-dependent phase, crystallinity and texture variations in materials |
| Applications | Texture / preferred orientation and stress analysis |
| Applications | Micro XRD for applications requiring spatial resolution between 100 and 400 microns |
| Applications | In-situ high-temperature (up to 900 o C) XRD analysis for phase transition, thermal expansion coefficient determination, stress and texture variations in materials |
| Typical materials | textured thin films and bulk materials |
Not seeing what you need? Contact us for a custom job.
Back